二硫化鉬

真空鍍二硫化鉬涂層性能優(yōu)勢(shì)

· Coating deposition carried out using a high density of low energy bombarding ions.

使用高密度低能量轟擊離子進(jìn)行沉積鍍膜。

· Deposition of very dense, non-columnar coating structures with low internal stresses.

鍍層致密度好，低柱狀晶結(jié)構(gòu)，內(nèi)應(yīng)力低

· Deposition of coatings with dense structures at low temperatures.

• 可在低溫環(huán)境下沉積致密結(jié)構(gòu)的鍍層

· High efficiency of ion cleaning resulting in coatings with the highest levels of adhesion.

高效率等離子清理以提供高的鍍層結(jié)合強(qiáng)度。

· Coatings quality is assured by the use of specially designed Plasmag sputter sources, which create an intense plasma and high ion bombardment of work pieces.

鍍層品質(zhì)保證是由使用專門設(shè)計(jì)plasmag濺射源及提供高密度的等離子。